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CN Reportedly Builds Reverse-engineered EUV Prototype, Successfully Generates Extreme Ultraviolet Light
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Chinese scientists constructed an extreme ultraviolet lithography (EUV) prototype machine in a highly confidential laboratory in Shenzhen, Reuters quoted sources as saying. The prototype occupies almost the entire floor of the facility, and was completed earlier this year, the sources noted. The machine is currently undergoing testing. It is operational and has successfully generated extreme ultraviolet light, although it has not yet produced functional chips. The sources added that Chinese government aims to use the prototype machine to produce functional chips by 2028, but project insiders suggested a more realistic target is 2030. AASTOCKS Financial News Website: www.aastocks.com |
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