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ASML Supplier Zeiss: CN Lags Around 15 Yrs Behind in Developing EUV Lithography Machines
2026-09-03 10:12:19
Frank Rohmund, head of the semiconductor division at Germany's Zeiss Group, said China lags around 15 years behind in the development of extreme ultraviolet (EUV) lithography machines, but acknowledged that it is difficult to quantify China's progress.

Zeiss is the exclusive supplier of optical components for EUV lithography machines of ASML (ASML.US). EUV technology is crucial for producing the most advanced chips of NVIDIA Corporation (NVDA.US).

Earlier reports indicated that China had made progress in producing previous-generation deep ultraviolet (DUV) lithography machines. Rohmund said any measures expanding export controls to include older DUV models would be unfavorable to business. He does not believe such export restrictions would have positive effects, as they would only accelerate China's technological innovation.

He added that China has been researching DUV technology for decades, and it would not be surprising if the country successfully produced related equipment. However, he said there is still a need to observe the actual capabilities of such lithography machines, emphasizing that ASML continues to maintain a substantial lead.
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